Used ULVAC SIV-500F #9269095 for sale

Name: ULVAC SIV-500F
Brand: ULVAC
SKU: 9269095
Availability: InStock

URL successfully copied!

Sputtering Systems

Manufacturer

ULVAC

Model

SIV-500F

ID: 9269095

Sputtering system UL/CH: Vacuum chamber: AI Chamber Accessories: Door grip opening mechanism (2) Carrier sensors Door sensor O-Ring Isolation valve (Between vacuum and vacuum) Transfer system: Carrier transfer mechanism Carrier 2-stage exchange system Measurements system: ULVAC SW-1 Pirani vacuum gauge SMC ZSE80F-A2L-R-M Atmospheric pressure switch Vacuum pumping system: Rotary pump ULVAC VLP-U3SW Roughing valve SMC XLG-50-M9NA-X62 Vent valve Piping Chamber B: Vacuum chamber: AI Chamber Accessories: Door grip opening mechanism (2) Carrier sensor Door sensor O-Ring Isolation valve (Between vacuum and vacuum) Transfer system: Carrier transfer mechanism Carrier 2-stage exchange system Substrate heating system: Heating mechanism Heater power supply Temperature controller with overheating Thermocouple Measurements system: ULVAC SPU Pirani vacuum gauge SMC ZSE80F-A2L-R-M Atmospheric pressure switch ULVAC SH2 Ionization vacuum gauge Vacuum pumping system: ULVAC CRY0-U12HSP Cryo pump Main valve: No APC Piping Gas inlet system: FUJIKIN FCST1005LUC-4J2-F200-AR MFC Ar: 200 SCCM Gas valve SWAGELOK Type Piping: Stainless steel Etching chamber: Vacuum chamber: AI Etching chamber Accessories: Door grip open mechanism (2) Carrier sensors Door sensor O-Ring Transfer system: Carrier transfer mechanism RF Etching system: RF Etching unit Cooling system: ESC Stage Power supply system: ADTEC TX30-DOOO-10 RF Power supply, 3 kW ADTEC AMVG-3000-NC Match box, 3 kW Rotation chamber: Vacuum chamber: Rotation chamber: Fe and Plated Accessories: (4) Carrier sensors O-Ring Transfer system: Carrier transfer mechanism Carrier rotation mechanism Vacuum pumping system: U12HSP Cryo pump Vacuum piping Main valve: No APC Measurement system: ULVAC SPU Pirani vacuum gauge SMC ZSE80F-A2L-R-M Atmospheric pressure switch ULVAC SH2 Ionization vacuum gauge Gas inlet system: FUJIKIN FCST1005LUC-4J2-F200-AR MFC Ar: 200 sccm Gas valve SWAGELOK Type Piping: Stainless steel Sputtering chamber (Ti): Vacuum chamber: AI Sputter chamber Accessories: Door grip open mechanism (2) Carrier sensors Door sensor O-Ring Transfer system: Carrier transfer mechanism Cathodes system: Magnetron cathode unit Stage system: RF Bias Stage Power supply system: ADVANCED ENERGY Pinnacle DC Power supply, 20 kW ADTEC TX30-DOOO-10 RF Power supply, 3 kW ADTEC AMVG-3000-NC Match box, 3 kW Sputtering chamber (Cu): Vacuum chamber: AI Sputter chamber Accessories: Door grip open mechanism (2) Carrier sensors Door sensor O-Ring Transfer system: Carrier transfer mechanism Cathode system: Magnetron cathode unit (2) ADVANCED ENERGY Pinnacle 20 DC power supplies, 40 kW Compressed dry air system: Filter regulator unit Solenoid valve unit Piping Speed controller Cooling water system: Water supply and return header manifold Cooling water piping Pressure switch Flow meter Structure frame system: SS400 Frame Panel.

Read More Close

ULVAC SIV-500F is an advanced, high-performance sputtering system designed for both power electronics and thin film technology applications. This highly automated platform features integrated optical, electrical and plasma diagnostics to ensure repeatable, high-quality results move after move. Its fundamental components are an easy-access process chamber and an integrated beamline. The heavy, water-cooled process chamber is constructed of stainless steel and is certificated for 200 mT atm-ccn operation. Capable of holding up to 15 substrate wafers in addition to an angled target holder, the chamber also has an integrated steering magnet and Faraday shield for field free, high-precision sputter deposition. The integrated beamline holds two sources of electron bombardment for non-reactive etching and pre-deposition surface treatments. Equipped with advanced control software, SIV-500F is designed to be simple to operate. It can be quickly and easily programmed to perform a wide range of sputtering recipes, enabling users to accurately replicate results for easy process optimization. In addition, all parameters and results can be stored and recalled for later study. The reliable, high-speed, and multi-source sputtering process makes ULVAC SIV-500F an ideal choice for thin film fabrication. Its advanced power supply technology allows for high currents, low arcing, and fast ramping times. Moreover, its sputter sources can be independently controlled, providing unmatched process flexibility. This flexibility can be further enhanced via the adjustable input power, operation frequency, and process gas flows. For increased safety, SIV-500F comes with an advanced safety features such as gas leak detection, auto-shut off, and an emergency interlock switch. Moreover, it is designed with user-friendly door locks, a large viewing window, and overhead illumination. In order to maximize throughput, ULVAC SIV-500F also offers advanced diagnostic tools which allow users to monitor all process parameters in real-time. To further enhance thin film fabrication, the system also comes with dedicated hardware and software for temperature and pressure control, along with automated systems for wafer-handling and conveyor systems for improved efficiency. Overall, SIV-500F combines robustness, reliability, and enhanced safety to create the perfect sputtering tool for industrial and research applications. With integrated diagnostics, ease of operation, and advanced features, ULVAC SIV-500F is the perfect choice for creating high-quality thin films.