Used ULVAC SIV-850 #9050843 for sale

Manufacturer
ULVAC
Model
SIV-850
ID: 9050843
Vintage: 2006
Vertical inline sputtering system Includes: Sputtering method: RF Sputtering side moving deposition Process: Exhaust operation, film-forming operation Exhaust system: Turbo molecular dry pump Process Gas: Ar, O2 Substrate: 850 mm x 1250 mm (max. effective) No return system 2006 vintage.
ULVAC SIV-850 is a PVD (Physical Vapor Deposition) sputtering equipment designed for industrial applications. The system is based on ULVAC unique magnetron sputtering technology and is capable of producing thin films of metals, oxides, and other materials on a wide range of substrates. The unit's advanced design is optimized for performance and simplicity with a compact footprint and a low cost of ownership. SIV-850 offers automated control of process parameters including temperature, pressure, RF power, and power density. The machine utilizes multiple sputter sources operating in either DC, pulse DC, or RF modes, allowing for wide range of potential applications. The tool is designed to be used with a variety of material types, including pure metal and alloy targets and complex multi-layer stacks, giving it the flexibility to accommodate a wide variety of thin-film deposition needs. The asset is certified for cleanroom operations, with a range of safety features, including auto-shutdown if safe operating parameters are exceeded. It is also designed to maintain a constant temperature within the deposition chamber, providing uniform and reproducible results. It also offers the ability to monitor process parameters in real-time via its built-in user interface, allowing for easy optimization of process recipes. The model's advanced design also ensures that the deposition rate is highly consistent and repeatable, while also reducing particle deposition. This provides reliable layers of very thin films, even when processing complex structures at high deposition rates. Furthermore, ULVAC patented "Direct Write" technology enables spot deposition, making it possible to deposit material only where it is needed. ULVAC SIV-850 is an excellent choice for industrial thin-film deposition applications, offering excellent performance, flexibility, and reliability. It is also an affordable equipment, making it attractive for both small and large production environments.
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