Used ULVAC SMD-1800X #9313943 for sale

ULVAC SMD-1800X
Manufacturer
ULVAC
Model
SMD-1800X
ID: 9313943
Vintage: 2018
Sputtering system 2018 vintage.
ULVAC SMD-1800X is a sputtering equipment designed for high quality thin film deposition. The system is comprised of an advanced motion-controlled motion sputtering unit, an ultra-high-vacuum chamber for efficient chamber evacuation, and a unique, sophisticated process machine that includes an intelligent process management tool. The motion controlled sputtering asset is capable of producing both reactive and non-reactive thin films. It consists of four sputtering sources, which can sputter up to three compounds separately or simultaneously. It also includes an eight-magnet disc, which is mounted on the target chamber for a stable sputtering environment. The magnet disc ensures a uniform film deposition on the substrate and minimizes deposition errors. The high performance chamber evacuates quickly and reaches ultra-high vacuums in short times. It has an open chamber design and includes four optical windows for monitoring and controlling the deposition process. In addition, it is equipped with an efficient, multi-zone elevation model for substrate resistors. This allows for uniform substrate elevation to maintain the desired chamber temperature. The multi-functional process equipment includes an advanced, high-performance substrate positioning system and a state-of-the-art substrate temperature controller. It also includes the Intelligent Process Management Unit (IPMS), which is designed for easy setup of process parameters and provides quick feedback on the quality of the deposited film. The "Process Check" function can perform various checks throughout the deposition process, to provide information on the performance of the deposition process. By utilizing the advanced technology found in SMD-1800X machine, thin film deposition can be accomplished with increased accuracy and speed while lowering process costs. With its precise and efficient operation, the tool provides ideal conditions for both fabrication of advanced electronic devices and thin film research.
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