Used ULVAC SMD-450 #9269729 for sale

ULVAC SMD-450
Manufacturer
ULVAC
Model
SMD-450
ID: 9269729
Sputtering system Control rack (GPCS) Process monitor Rotary pump rack (RP5).
ULVAC SMD-450 is a highly advanced sputtering equipment designed for use in thin film deposition processes. It is capable of producing a wide range of thin films in an incredibly efficient way, thanks to its many advanced features and components. The system utilizes an ultra-high vacuum chamber, capable of maintaining pressure levels of up to 10-5 Pa. This enables it to achieve sputtering rates of up to 1.5 nm/s. SMD-450 is a dual-stage, modular unit, allowing the user to combine different sputtering sources (including DC, pulsed and filtered cathodic arc sources) to achieve the desired results. The machine is capable of sputtering low to high viscosity materials, including amorphous and polycrystalline metals, ceramics, composites, and dielectric materials. It is also able to sputter compounds, which is of particular importance in many Thin Film Solar Cell applications. The tool is designed such that sputtering with different compounds can be achieved in an individual run, allowing for great process efficiency. In addition, the asset has excellent substrate bias, RF, and plasma cleaning capabilities. This allows the user to obtain better quality thin films with tighter surface morphology, and higher densities. Uniformity of the films is also enhanced through its ECR (induced arc discharge) source technology, which helps to pinpoint the substrate area where sputtering is to occur, thus ensuring even and homogeneous deposition characteristics. The dense deposition rate of up to 8 nm/min, together with its capability to deposit a wide variety of materials, make ULVAC SMD-450 a valuable tool for Thin Film Manufacturing. The model's flexibility, quality, and overall efficiency make it well suited for use in Electronic applications such as hard disk and tunneling magnetoresistance(TMR) head production, as well as for Optical applications such as Antireflective (ARD) and Transparent Conducting Oxide (TCO) production. Moreover, its higher throughput and high viscosity process compatibility means it can be used for Digital Mirror Device (DMD) production.
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