Used ULVAC SMD-450 #9269742 for sale

ULVAC SMD-450 sputtering equipment is a state-of-the-art tool for deposited thin films on wafers and substrates. This sputtering system integrates the latest in energetic and uniform sputtering technology, making it an ideal choice for research and industrial applications. SMD-450 is equipped with two cathodes, enabling the deposition of two separate layers on the sample at the same time. It features a two-level linear source structure for maximum ion bombardment, increased uniformity, and decreased ion channeling. This advanced unit also can be configured with any target material, such as metals, oxides, nitrides, semiconductors, and others. In traditional magnetron and inert gas sputtering, the substrate temperature is not controlled. This causes different film thicknesses over different parts of the sample. ULVAC SMD-450 features an advanced temperature-controlled substrate holder, enabling users to control the substrate temperature up to 400°C. This eliminates the non-uniformity caused by thermal drift. SMD-450 also features a compact footprint and is designed for efficient utilization of space. It has a total of four chambers for up to 10 targets, while its large-capacity target port enables swift loading operations. To reduce maintenance time and cost, it features a two-stage closed-loop cooling machine that captures water and dust. This sputtering tool supports a variety of high-precision plasma control systems to provide a uniform and even sputtering profile. It also offers a high degree of process control over parameters such as duty ratio, pressure, and gas flow. This tool can handle a variety of samples and substrates, including irregularly shaped items and sections, as well as small-scale devices and structures. The advanced ULVAC SMD-450 sputtering asset delivers unsurpassed control, reliability, uniformity, and productivity. It is the ideal choice for producing thin film layers on numerous kinds of substrates and samples.