Used ULVAC SMD-450 #9411767 for sale

ULVAC SMD-450 is a sputtering equipment used to deposit thin films onto various substrates. It is an advanced system with multiple sputter sources and materials, making it ideal for applications such as manufacturing optical or electrical structures and devices. SMD-450 is a single-chamber, dual-magnetron sputtering unit built to small size specifications, yet containing all the necessary components for efficient and effective sputtering. The machine utilizes large magnetron coils to produce powerful fluxes of argon ions along with a broad spectrum of target materals, allowing for the production of high purity films with excellent adhesion. ULVAC SMD-450 can accommodate substrate sizes up to 200 mm in diameter and substrates of any thickness and materials, including plastic, ceramic, glass, and metal foils. It operates at a maximum working pressure of 7.5x 10-5 Torr and can reach a substrate temperature of up to 1000 ℃. The sputtering source incorporates two independently sealed cathodes, each with its own magnetron coil. The first source is used for transparent conducting oxides (TCOs) and other sputtered materials and the second source is used for metallic layers such as stainless steel, aluminum, cobalt and other metals. The total output power can reach up to 2.5 kW, allowing for fast and efficient deposition. Further, the chamber environment of SMD-450 can be controlled precisely with its in-situ atmosphere tester. This makes the tool suitable for depositing various layers of materials with low-temperature evaporation and oxidation conditions, allowing for greater control of the film quality. The asset also provides a wide range of process features to enhance the deposition process. These features include adjustable doping, directional pulsed deposition, and multi-step deposition. Additionally, the automated process controls enable easy and accurate deposition, providing high repeatability and consistent film deposition. In conclusion, ULVAC SMD-450 sputtering model is the perfect solution for clean, uniform depositions of thin films on various substrates at a high rate of speed. The equipment provides precise and accurate control of the film parameters while also enabling a wide range of different materials to be sputtered. The system is a valuable tool for various applications in the fields of optics, electronics, and automation.