Used ULVAC SME-200E #9392582 for sale
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ID: 9392582
Vintage: 2006
Sputtering system
Base plate: 200 mm
Dielectric module
High temperature film forming module
Precision distribution module
Etching module
LED
Memes
Power supply included
2006 vintage.
ULVAC SME-200E is a high-performance sputtering equipment designed for advanced industrial and research applications. It features rotatable and adjustable sputter sources and substrate holders, giving users the flexibility to achieve a wide range of deposition and surface treatment processes. SME-200E is capable of providing clean, uniform and high deposition rates for any film thickness. ULVAC SME-200E is configured with a state-of-the-art magnetron sputtering source. The power of the magnetron sputtering source can be varied from 0-1000 Watts, allowing for a wide range of targets and film thicknesses. The substrate holder is adjustable and can accommodate substrates up to 12 inches in diameter and 0.008 to 0.125 inches in thickness. This allows for a variety of applications, such as Flat Panel Displays, LSI and MEMS devices, magneto-optic disks, superconducting films and optical films. SME-200E offers high-precision control of the sputtering process via a series of control systems. The internal controller allows users to control the electrodes, the sputtering power, the rotation speed and the film thickness. The advanced control system of ULVAC SME-200E also allows for the deposition of complex films with different components. The unit is equipped with an optical pyrometer, allowing users to monitor the temperature of the substrate holder. SME-200E is constructed with a electrostatic shield and an integrated gas distribution machine, allowing for the deposition of films in a variety of environments, ranging from ultra-high vacuum to atmospheric pressures. Additionally, ULVAC SME-200E can be connected to external devices for measuring the concentration of gases such as argon, oxygen, and nitrogen within the chamber. SME-200E is engineered to ensure reliability and repeatability, making it an ideal choice for a variety of production and research processes. The tool is able to provide uniform films with few defects and a higher yield rate. Furthermore, the modular design of the asset makes it easy to expand, upgrade and service the model, ensuring greater flexibility and cost-efficiency.
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