Used ULVAC SME-200LDM #9055124 for sale
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ID: 9055124
Vintage: 2010
Sputtering system
Single wafer type
(1) 4-Chamber, 2-RTA
(1) 6-Chamber
2010 vintage.
ULVAC SME-200LDM is a state-of-the-art sputtering equipment designed for a variety of industrial coating needs. It offers excellent uniformity of layer deposition, as well as control over process parameters, along with high deposition rate capabilities. The system is equipped with an advanced multi-pocket sputter target assembly, with up to twelve round targets of 80mm in diameter capable of providing uniform and precise film deposition. The multi-pocket arrangement allows the operator to utilize different sputtering targets or to move targets to different locations in the deposition process. SME-200LDM features a vacuum chamber with 150 mm gap between the substrate and the target. This enables large sputtering areas and high deposition rates, with the ability to coat substrates up to 330 mm diameter. It is equipped with a high efficiency oil-free scroll type direct-drive mechanical pump, which provides rapid evacuation and minimizes downtime. In addition, the unit is also compatible with external vacuum pumps for further improved performance. In order to ensure the highest level of uniformity, ULVAC SME-200LDM is equipped with a dynamic mylar mask scanner that compensates for substrate curvature and fluctuating gap between substrate and target. The machine also features a dynamic shutter assembly in order to quickly achieve a high-quality coating. The shutter assembly can shift in order to maintain a uniform deposition rate regardless of changes in the substrate shape or geometry. SME-200LDM is also equipped with a unique Process Window Controller (PWC). The PWC is a software package that utilizes a real-time analysis of deposition rate, film thickness, and surface topology in order to optimize the entire sputtering process for higher throughput and better quality. Finally, the tool is configured with a controller panel that allows for full process control and monitoring. All asset parameters can be easily set, monitored, and adjusted to suit user needs. This makes the sputtering model extremely flexibile and enables users to quickly make adjustments in order to achieve their desired deposition profiles. Overall, ULVAC SME-200LDM is an advanced sputtering equipment capable of providing excellent, uniform, and controlled zone coverage, as well as high deposition rates. Its versatility and extensive features make it an ideal choice for a variety of coating needs.
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