Used ULVAC SME-200U #9107279 for sale

ULVAC SME-200U is a high-performance sputtering equipment designed for use in thin film engineering. The system features two independent power supplies, each with an integrated controller, providing up to 200 W of combined power, with a maximum DC current of 400 mA. This allows for the deposition of a wide variety of materials including noble metals, dielectrics, ceramics, and semiconductor materials at various thicknesses and deposition rates. ULVAC SME 200 U utilizes a 4-point magnetron sputtering gun configuration, which enables superior material utilization as well as enhanced process uniformity. The 4-point source design further facilitates the integration of multiple targets and the ability to deposit layers of different materials in the same cycle. The unit also boasts a specially designed bell jar chamber for improved performance under high pressure and elevated temperatures. The unit is designed for ultra-high vacuum (UHV) processing, and includes other features such as a roughing pump, multi-stage foreline trap, gas purification machine, and an advanced control tool. This asset allows for the versatile application of sputtering. The dual power sources enable the deposition of materials in a variety of patterns, such as short, broad, or narrow. The flexibility of the model also allows for both planar and rotational sputtering processes, such as the deposition of large, rotated target surfaces and metal stents. In addition, with the utilization of two substrates, the multi-target capability allows for the application of top and bottom layers simultaneously in a single rotation. SME-200U further features a three-gas operation capability for reactive sputtering, allowing users to easily integrate this mode into their process without the need for additional gas manifolds. The equipment includes built-in vacuum diagnostics, as well as an off-pump arc detection system for enhanced safety. Finally, a programmable automation unit adds increased reliability and reproducibility to the machine, making it ideal for high-volume operations. Overall, SME 200 U provides a robust and reliable sputtering platform for the deposition of thin films. Its dual power sources and flexible configuration allow for a wide variety of processes to be performed with greater precision and repeatability, making it a valuable tool in a wide range of industries.