Used ULVAC SMR-2110E #9078345 for sale

ULVAC SMR-2110E is a high-performance sputtering equipment designed for use in a variety of industries. Its flexible configuration and high-precision manufacturing offers exceptional performance and reliability in both academic and industrial research. SMR-2110E is a multi-substrate sputter deposition system that supports up to ten target materials such as aluminum, alloying materials, ceramic dielectrics, and oxides. It uses high-frequency magnetrons and a rapid gas-flow unit to provide superior uniformity and high rates of deposition. Its modular capability allows for simple maintenance and repair operations. ULVAC SMR-2110E is equipped with an Al 2 O 3 /SiO 2 target isolation chamber, ensuring maximum sample protection. The substrate holder is designed to deliver excellent uniformity and minimal sample drift during sputtering. It comes with an intuitive programming software interface that simplifies programming complex multicolored and multilayer sputtering processes. The machine also features advanced vacuum technology, allowing a base pressure as low as 2.5x10-6 Pa. It is equipped with an ion clean tool, providing improved particle removal and resulting in a clean vacuum environment. Programmable gas injection and advanced digitally-controlled gas supply systems allow for multiple gas treatments to be performed. SMR-2110E has high-speed deposition options, allowing it to achieve thin film deposition rates up to 30 microns/second, depending on the target materials. It offers excellent repeatability and process control, resulting in reliable and reproducible results. The sputtering rate can be fine-tuned with an external power supply or the included external input capability. Overall, ULVAC SMR-2110E is an excellent sputtering asset, capable of serving many different applications. Its high-precision manufacturing, advanced vacuum technology, and intuitive programming software allows for reliable and precise performance. The adjustable sputtering rates, various target materials and excellent repeatability make this model highly versatile and suitable for many different research requirements.