Used ULVAC SRH-420 #293821025 for sale

ULVAC SRH-420 is a sputtering equipment designed and manufactured by ULVAC, a leading supplier in the semiconductor industry. Its main purpose is to deposit a thin layer of metal or other material onto a substrate or the surface of a semiconductor wafer. SRH-420 features four process chambers in one single system, providing high-performance sputtering to cover the needs of multiple production processes. It is equipped with a special dual-source target drive unit which allows users to sputter two materials at one time. This feature allows for faster overall processing, as well as improved uniformity of films. In order to ensure high-quality films, ULVAC SRH-420 offers many different types of sputtering process control functions. It is equipped with a unique Bias Voltage Control Machine, which stabilizes the sputtered area and reduces the effects of particles. Additionally, it has a floating zone process (sub-pressure sputtering) for improved uniformity and adhesion in the process of coating. SRH-420 is also equipped with a bevel film, which increases the wettability of the substrates for improved durability. ULVAC SRH-420 has a maximum substrate size of 8" X 4". The tool is compatible with a variety of substrates, such as glass, silicon, quartz, and some metals. The asset uses two independent targets, which enables the use of multiple materials in the production process. Its sputtering processes can be adjusted to work in different ways, such as glow-discharge, DC magnetron, and sequential-sputtering. SRH-420 offers higher throughput and greater processing accuracy than other similar systems. Its unique combination of advanced process control functions and features produce high-quality films that increase product reliability. The model is also reliable, robust, and offers excellent ergonomics. It is designed for continuous operation for extended periods of time, reducing downtime and increase yield. Overall, ULVAC SRH-420 is a reliable, feature-packed sputtering equipment that promises excellent throughput and films. This system offers numerous process control functions and is capable of producing high-quality films for a variety of substrates. It is the ultimate choice for those who require the highest level of performance from their sputtering systems.