Used ULVAC SV-4540 #9313930 for sale

ULVAC SV-4540 sputtering equipment is designed to provide precise coating of substrates with materials of various shapes, sizes, and weights. This system utilizes dual DC and RF Power sources, advanced sputtering technology, and an optimized process sequence to afford superior coating quality and reliability. SV-4540 is a highly automated and multi-functional unit that enables a wide range of process capabilities. It supports up to four sputter sources, two pumps, and a high-temperature in-line temperature controller. It offers a variety of high-vacuum process options, including reactive sputtering, magnetron sputtering, low-pressure sputtering, ion beam sputtering, and more. The machine offers options for process gas control, with processes such as gas led deposition capable of being carried out. It utilizes advanced HMI (Human-Machine Interface) with a touch-screen enablement. This tool also features high-vacuum interlock systems, in-situ automatic pressure control, and a wide choice of process controllers. ULVAC SV-4540 is characterized by its excellent performance and cost-effectiveness. It has an automated and user-friendly control asset that allows process optimization and enhanced process reproducibility. This sputtering model incorporates active pressure control and a fast-pulse DC source, delivering uniformity and high reproducibility for various process applications. SV-4540 Sputtering Equipment is backed by high-precision engineering and reliable operation. It features on-board part recognition, precise sputtering control, and large chamber size for accommodating substrates of various sizes and shapes. Moreover, it features precise material control, enabling it to deposit materials with highly uniform layer thickness. All-in-all, ULVAC SV-4540 Sputtering System provides precise operation, superior layer coverage and uniformity, and cost-effective results. This user-friendly unit allows for process optimization and reliable substrate coating with high reproducibility, making it ideal for a wide range of process applications.