Used ULVAC ULDIS-200UCP #9266626 for sale

ULVAC ULDIS-200UCP
ID: 9266626
Vintage: 2013
Digital sputtering machine Turntable 2013 vintage.
ULVAC ULDIS-200UCP is a high-performance magnetron sputtering equipment that offers stable and high-quality sputtering process. It consists of a 200mm diameter, 6-target configuration with a large outer diameter and uniform sputtering. Its optimized plasma-generating technology and advanced cathode-material technology enables low-stress and low-deformation sputtering, ensuring stable and reliable repeatable processes. ULDIS-200UCP features a high-accuracy delta-type target rotation system and a 6-axis robotic chopper. Furthermore, its open chamber design and highly efficient dry-type 5-stage filtration unit allows for improved deposition uniformity, even on substrates with complex shapes. It also has a high-precision closed-loop temperature control machine that allows precise temperature control. ULVAC ULDIS-200UCP also has a multiple-process support structure, which allows for coordinated control of the process pressure range and the vacuum range. This makes it an efficient machine for sputtering applications like thin film depositions. In addition, its Auto-Tuning tool can independently tune the process parameters for each target, allowing for optimized and stable sputtering performance. Moreover, this asset has an integrated energy-recovery mechanism which can recover the generated sputtered particles and re-use them, leading to less waste and reduced costs. This model also has state-of-the-art safety features such as the built-in temperature alarm, pressure-detection sensors, and overload protection. Additionally, its advanced software suite allows users to monitor, control, and manage the process parameters to customize the sputtering processes. In conclusion, ULDIS-200UCP is an advanced and reliable sputtering equipment with its unique features, which enable stable and high-quality sputtering process. Its multiple-process support structure allows for precise and cost-effective sputtering, and its energy-recovery mechanism enables efficient processes. It also has comprehensive safety features and customizable sputtering processes to match every user's needs.
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