Used ULVAC ULDIS-900-CHL #9392461 for sale

ULVAC ULDIS-900-CHL is a sputter deposition equipment designed for the creation of thin film structures. This system is a compact setup with a small footprint for the deposition of metallic, dielectric, and/or magnetic materials. With a versatile dosing and ion pumping unit, ULDIS-900-CHL enables uniform sputter deposition of materials with thicknesses as thin as those required for semiconductor devices. ULVAC ULDIS-900-CHL is powered by a 900-W DC magnetron sputtering source that can be tightly controlled down to the milliamp level. This allows for precision control over the sputtering process and allows the user to fine-tune the amount of material deposited on the target surface. The source also includes a vacuum chamber that can be evacuated to a pressure as low as 15.3 mTorr. ULDIS-900-CHL employs several features for optimized deposition. A high-variable frequency gas plenum allows for precise control of the ion-bombardment depth of the depositing material. A fast-sweep source control allows users to achieve rapid quantitative composition transitions within the same coating layer. Meanwhile, the inclusion of an oxide trap and active coater aids in uniform oxide deposition. In addition, the chamber has a temperature monitoring machine for thicknesses in the 0.1-200 nm range. The sample holder of ULVAC ULDIS-900-CHL is 6-in. single-axis rotatable table with the capability of carrying up to 2 substrates. The holder is heated to temperatures up to 100 °C for the enhanced deposition of soft materials. A 4-way gas delivery tool completes the sample deposition sequence and enables the preparation of samples with simple, complex, and highly specialized structures. ULDIS-900-CHL is a powerful sputtering asset for creating thin film structures. By enabling precision control over deposition rate and ion-bombardment depth, this model allows the efficient and accurate deposition of metallic and dielectric materials. With a high-variable frequency gas plenum, a fast-sweep source control, an oxide trap, an active coater, and a temperature monitoring equipment, this system provides a great deal of versatility and accuracy.