Used ULVAC ULDiS-900CH #9313966 for sale

ULVAC ULDiS-900CH is a sputtering equipment developed for high throughput sputter deposition of thin films. The system can deposit a wide range of materials, giving the user a large degree of freedom in terms of process parameters and deposition rate. The unit is composed of two main components: the vacuum chamber and the power supply, which enables DC and pulse DC sputtering discharges. The vacuum chamber is a robust, water-cooled stainless steel structure with top loading access, and a rectangular vacuum vessel with quartz or stainless steel walls. The chamber has a standard base pressure of 1 × 10-6 Pa or lower, and is capable of reaching 10-9 Pa or lower with additional pumping. It's also equipped with refrigerated cold traps and a turbo pump, as well as an integrated gas inlet and control. The power supply machine is a compact, high-speed switch-mode generator that uses a high-frequency pulse for cathode power. This power supply is capable of both continuous DC and pulsed DC sputtering discharges, which enables effective uniform film deposition on the target. It can also deliver power densities of up to 50 W/cm2, with an adjustable burst frequency. The pulse width and output voltage are adjustable depending on the type of material being deposited and process requirements. ULDiS-900CH materials are held in place by an adjustable electrostatic chuck and laser-based viewing tool. In addition, the asset features an automated wafer loading/unloading module, and the whole model is compatible with a range of software interfaces for process control, data acquisition, and recipes development. Overall, ULVAC ULDiS-900CH sputtering equipment offers an effective solution for high-throughput, large-area sputter deposition of thin films. With its adjustable power supply system, adjustable electrostatic chuck, laser-based viewing unit, and automated wafer loading/unloading module, it provides an efficient and reliable way of depositing thin films.