Used ULVAC Z-1200 #293610444 for sale

ULVAC Z-1200 is a high-precision sputtering equipment typically used for advanced thin film deposition. It is designed for superior control of deposition rate and film uniformity. It offers a comprehensive range of physical vapor deposition disciplines, including inductively coupled plasma (ICP) and direct current (DC) sputtering. With advanced ultra-high vacuum (UHV) technology, high-quality thin film deposition is achieved. Z-1200 is equipped with ULVAC direct current power source, which produces advanced DC output characteristics with low arcing, allowing high-precision deposition without re- striking. This power source is capable of generating up to 1000 W of power, enabling highly compliant coatings. The power source also features temperature control of up to 1000 deg C and can be operated by remote control. Additionally, ULVAC Z-1200 is equipped with a vacuum gauge module, allowing gauge placement and movement within the chamber. Z-1200 comes equipped with multiple sputtering sources, allow users to have multiple reactive process to create the perfect thin film deposition. In addition to DC sputtering, the system features both ionized and non-ionized sputtering, metal and ceramic deposition, and accurately controlled magnetic functions for superior deposition rate and film uniformity control. The unit is composed of two main components, the main chamber and the sub- chamber. The main chamber enables UHV with a base pressure of 3×10-10 torr. Inside is a rotating turntable to enable multiple sputtering sources. The sub-chamber is where the plasma is generated and created. This design allows ULVAC Z-1200 to mix different gases for plasma generation. Z-1200 also has heating capability with two thermal diffusion pumps and the option of a ceramic heater. Water cooled process control is also featured on the machine, allowing accurate and efficient temperature control. Additionally, the tool features a deformable mirror and deposit ionizer (DMI/DMAI) that make it ideal for atomically conformal deposition. ULVAC Z-1200 is a powerful and versatile sputtering asset that offers advanced thin film deposition with multiple physical vapor deposition disciplines. The model is comprised of high precision components, offering superior control of deposition rate and film uniformity, as well as sophisticated UHV technology for highly compliant coatings. This powerful equipment is the perfect choice for research and development laboratories who require the utmost precision in their thin film depositions.