Used ULVAC Zi-1000 #293829724 for sale

ULVAC Zi-1000 Sputtering Equipment offers excellent film quality and uniformity from its extremely uniform and low-pressure gas discharge source. This system is designed to be used for a number of different applications, including semiconductor device production, optical device production, materials research, and ceramic thin film deposition. The unit incorporates a wide variety of features that make this machine ideal for use in high-end thin film deposition processes. Zi-1000 features a two-pocket dual magnetron sputter source, which can be used to sputter both conductive and non-conductive materials. This source is designed to provide a film deposition rate of up to 30 nm/min. ULVAC Zi-1000 also features a patented low-pressure, multi-frequency, DC magnetron source for improved ionization efficiency and uniformity of the deposition process. Zi-1000's robotic sample manipulator makes it easy to transfer substrates from the tool's chamber to a holding rig. This sample manipulator also allows for the continuous deposition of multiple layers onto the substrate, without having to remove and replace it manually. The asset's computer-controlled vacuum gauge provides accurate readings to ensure consistent process conditions. The model also has an automated vacuum pressure controller, allowing for ease of operation and precise control of the chamber pressure. ULVAC Zi-1000 is equipped with an integrated film thickness monitor which draws data from a computer-controlled quartz crystal oscillator for precise measurements. This feature ensures the repeatability and integrity of the deposited film. Zi-1000 offers a number of other features, including a high-precision deposition rate control equipment, automated cleaning of the deposition chamber, and a digital temperature control system. The unit is also designed with safety features to prevent accidents. ULVAC Zi-1000 its excellent performance and unique features make it an ideal choice for sputtering processes that require a high degree of control and precision. The machine's versatility means that it can be used to produce films of different materials, with excellent uniformity and repeatability, making it a perfect choice for many kinds of applications.