Used ULVAC Zi-1000 #9379267 for sale

ULVAC Zi-1000 is an industry-leading sputtering equipment commonly used for production related purposes. It incorporates a vertical structure energy-efficient, high-speed magnetron and gun turntable that allows it to deposit thin films at a rate more than five times faster than conventional systems. The system has a large substrate area, allowing a variety of large and small substrates to be sputtered together. This vertical type sputtering unit with its unique high aspect-ratio substrate holder and direct drive machine further improves sputtering speed and uniformity and eliminates the need for shadowing during thin film deposition. Additionally, Zi-1000 features an online, real-time two-stage turbo pumping tool for improved vacuum performance. The turbo-pump asset helps the vacuum environment to reach deeper pressure in a much shorter time so that the deposition process can be started very quickly. It also ensures higher pumping rate to prevent contamination of the substrate surface as well as longer operational life of the vacuum pumps. The model is equipped with advanced intelligent operation control with a multi-function controller connected to the HMI (Human-Machine Interface). This software allows efficient control of the substrate temperature, deposition rate, and layer thickness. This combined with real-time monitoring of the environmental temperature, pressure, humidity, and gas causes a highly efficient and reliable thin film deposition process. ULVAC Zi-1000 also offers compatibility with multiple sputtering targets and a maximum vacuum level of 2 x 10-4 Pa. This excludes the need for contaminants or backside cleaning before thin film deposition. Furthermore, the high-power magnetron offers compatibility with a variety of reactive targets such as Al, Mo, Ti, and Co. Overall, Zi-1000 sputtering equipment is an efficient and reliable sputtering system commonly used for production related purposes. It offers a higher working efficiency than conventional sputtering systems, and its two-stage turbo pumping unit helps to achieve an even higher vacuum. In addition, the highly efficient and user-friendly intelligent operation control offers convenient control over deposition rate and layer thickness. Finally, its compatibility with multiple sputtering targets and the ability to achieve a vacuum level of 2 x 10-4 Pa make it one of the most advantageous sputtering systems in the market.