Used UNAXIS / BALZERS LLS EVO #9167778 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

ID: 9167778
Wafer Size: 5"
Vintage: 1999
Sputtering system, 5" (3) Targets: NiCr, NiFe, CoNiFe Currently warehoused 1999 vintage.
UNAXIS / BALZERS LLS EVO is a powerful sputtering equipment designed for the deposition of thin films. Specifically, it offers advanced deposition capabilities for various types of metal films, including aluminum, chromium, copper, and titanium. UNAXIS LLS EVO is a modular system that can be tailored to the individual needs of its users. It is based on a linear magnetron source and includes a unique in-situ plasma monitoring and plasma control feature. The unit is equipped with a vacuum chamber capable of supporting a base pressure below 8 x 10-7 mbar. It is also equipped with a gas-shower machine, enabling the tool to operate in reactive gas environments. BALZERS LLS EVO allows for remote manipulation of the gas pressure, temperature, and the Pl of the asset, making it capable of deposition on various substrates, including ITO, PEN, and Silicone. The model also offers a variety of cathode sources, including multi-element sources such as aluminum and chromium, as well as monolithic sources such as titanium and copper. LLS EVO features an in-situ plasma monitoring equipment that provides real-time information for deposition parameters, such as substrate temperature, base pressure, system TMS (Target Material Supplied), and deposition rate. This feature makes it possible to optimize the deposition process in a targeted manner. The unit also offers a powerful and ergonomic user interface with an intuitive graphical user interface as well as touchscreen features. This enables users to control the machine remotely to effectively manage the deposition process. UNAXIS / BALZERS LLS EVO is suitable for a variety of different film applications, such as ITO, PEN, and silicone. It offers an excellent base pressure, which facilitates the deposition of ultra-thin films. Additionally, the tool features advanced cooling technology which helps maintain an optimal substrate temperature. The asset also offers a high level of process control, enabling users to effectively manage the deposition process. All in all, UNAXIS LLS EVO is an excellent sputtering model for the deposition of thin films.
There are no reviews yet