Used UNAXIS / BALZERS UNI 800 ECO #9285795 for sale

UNAXIS / BALZERS UNI 800 ECO sputtering equipment is a versatile high-performance deposition device used for the production of thin films on various metallic, ceramic, and plastic substrates. It consists of a process chamber, RF and DC power supplies, a load-lock, substrate holders, and a controller. The process chamber has an inner diameter of 305 mm, and can accommodate up to eight samples of any of the aforementioned substrates. Gas flow into the chamber is controlled by two gas inlets, which allow for the introduction of reactive gases for reactive deposition, and for sputter cleaning. The chamber also features a loading/unloading system, which is automated and can accommodate substrates from 2 to 8 inches in diameter. The RF power supply allows for high deposition rates, while the DC supply ensures the uniformity of the film. It offers up to 800 W of power at 13.56 MHz frequency. The load-lock, which is of a dynamic type, ensures the continuous operation of the unit when loading and unloading substrates. It can accommodate up to four substrates. The substrate holders provide low temperature uniformity during sputtering and have independent support of up to 250 kg for each holder. The magnetic field array allows focusing the deposited particles when the substrate holders are tilted. The controller, which runs with Windows-based software, provides an easy-to-use intuitive user interface. UNAXIS UNI 800 ECO is a reliable, state-of-the-art machine suitable for a wide range of sputtering applications. It is capable of depositing a wide range of materials, and provides a high quality of uniformity and throughput. Its advanced features make it an ideal tool for large scale production.