Used VACUUM INDUSTRIES 1806 #293658124 for sale
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VACUUM INDUSTRIES 1806™ is an advanced, high-performance sputtering equipment that offers excellent process control through a unique, proprietary system technology. 1806 is a full-featured unit that has a total sputter coverage area of 18 inches by 8 inches and the standard chamber size is 3 feet wide by 6 feet deep with the option for an additional 3 feet wide by 2 feet deep. VACUUM INDUSTRIES 1806 sputtering machine uses a combination of RF and DC power supplies along with a rotary target mechanism to ensure uniformity and control of the deposition process. The DC power supply is used to form the arc between the target and the substrate for efficient sputtering of uniformly. The RF supply maintains the deposition rate at desired levels. The rotary mechanism actively adjusts the target angle relative to the substrate to ensure uniform sputter rates. 1806 also employs high-performance VACUUM INDUSTRIES advanced Magnetic Cascade Sputter ion source (MCSIS). The MCSIS is employed to provide a high flux of ionized particles and to deliver smoother and more consistent sputter processes. Additionally, an Ultra High Vacuum (UHV) chamber with a base pressure of 10-6 Torr is standard on the tool. The UHV also ensures extremely low contamination and superior substrate cleanliness. VACUUM INDUSTRIES 1806 is controllable through a series of robust voltage, current, and timing control interfaces to enable precise control of processes. The asset can also be monitored in real time to quickly detect any potential issues during operations. 1806 also includes advanced safety features such as emergency stop functions and fault trip functions. Finally, VACUUM INDUSTRIES 1806 is a powerful platform for materials deposition and surface engineering processes. VACUUM INDUSTRIES has a comprehensive range of sputtering targets for a variety of applications such as dielectric, conductor, semiconductor, and magnetic deposition material. 1806 model is a perfect choice for laboratories and industry applications requiring high performance, advanced process control, and reliability.
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