Used VARIAN 3100 #9165616 for sale

VARIAN 3100 sputtering equipment is a fully automated thin film deposition system commonly used in the fabrication and characterization of thin film samples. The unit is designed to deposit a variety of thin films, including semiconductors, metals and polymers, onto substrates of any size, shape and morphology. The machine consists of a high-vacuum deposition chamber, a motorized sputtering cathode assembly, a plasma generator, and a high-vacuum gate valve. The high-vacuum deposition chamber is a vacuum-sealed containment tool with an internal pressure of 10-4 torr or lower. This feature ensures that unwanted contaminants do not enter the asset, thus providing exceptional quality and consistent deposition parameters. Inside the chamber is a motorized sputtering cathode assembly, which is used to sputter the desired material onto an appropriate substrate. The sputter gun can be programmed to easily change deposition parameters, such as duration, power and direction. The sputter gun is also equipped with a plasma generator, which is used to create a glow discharge within the chamber and further assists in the sputtering process. This helps to ensure consistent deposition throughout the entire sample, even at the edges. 3100 sputtering model is also equipped with a high vacuum gate valve, which provides a safe seal between the external environment and the high-vacuum deposition chamber. This feature helps to ensure that unwanted contaminants do not enter the equipment, further ensuring consistent results and superior thin film deposition quality. In addition, the system is also equipped with a vacuum control module, which allows the user to manually adjust the chamber pressure. This feature helps to ensure consistent results and consistent deposition parameters during deposition, and is essential for accurate deposition of thin films. Finally, VARIAN 3100 sputtering unit is also equipped with a data acquisition machine for recording the deposition parameters. This feature allows users to accurately monitor and record the deposition parameters over the entire deposit, and also allows for record keeping and data visualization. In summary, 3100 sputtering tool is a fully automated deposition asset specifically designed for the fabrication and characterization of thin film samples. It boasts a high-vacuum deposition chamber, a motorized sputtering cathode, a plasma generator, a high vacuum gate valve, a vacuum control model, and a data acquisition equipment. All of these features help to ensure accurate and consistent deposition parameters for the best results.