Used VARIAN 3119 #293704657 for sale

VARIAN 3119 sputtering equipment is a powerful tool for deposition of high quality, highly uniform thin films on substrates in an inert or reactive environment. 3119 is a vacuum deposition system that can be used for deposition of a wide variety of materials, such as metals, alloys, and semiconductors. It uses a number of magnetic field confinement systems and sophisticated power processing electronics to enable the deposition of layers of materials at precisely controlled thicknesses. The unit includes an evacuated chamber with a stainless steel base, and uses an innovative magnetic field confinement technique to produce highly uniform and smooth layers of material. The machine includes an electron beam source for sputtering, which is used to cause the layer of material to form on the substrates that are to be coated. The electron beam and sputter deposition take place under controlled temperatures, controlled energy deposition rates and controlled distance between the electron beam and the substrate. The electron beam source provides fast and uniform coating on substrates. In addition to the electron beam source, VARIAN 3119 sputtering tool is also equipped with sources for both reactive and non-reactive gas sputtering. This is important since the asset can be used in both inert and reactive conditions to provide different electrical characteristics and/or chemical composition of the resulting thin films. The model also includes a number of sensors and transducers for monitoring the deposition process, such as pressure, temperature, deposition rate, and material thickness. The equipment is enclosed in an ultra-high vacuum chamber, which is sealed and thermally insulated, enabling deposition at pressures as low as 10−8 torr. The chamber is equipped with an automated gas delivery system, which provides the gas supply for both reactive and non-reactive gas sputtering. There is also a plasma generator for reactive sputtering and plasma etching applications. The unit is also equipped with a cooling machine to maintain the temperature inside the chamber during deposition processes. The tool includes a turbo molecular pump to evacuate air from the chamber in order to maintain a low-pressure environment. Finally, the asset includes a digital readout with data logging and control functions that allow for automated deposition processes. Overall, 3119 sputtering model is a powerful and sophisticated tool for creating thin films with a high degree of uniformity, quality, and precision. It offers a wide range of advanced features and settings that allow for efficient and reliable production of thin films on a variety of substrates in an inert or reactive environment.