Used VARIAN 3120 #9069403 for sale
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ID: 9069403
Wafer Size: 6"
Vintage: 1987
Sputtering system, 6"
(3) Planets
Diffusion pump: VHS-250
(3) Varian DC P/S
RF gen: 1kW
UNIT MFC heater with controller
1987 vintage.
VARIAN 3120 sputtering equipment is an advanced tool for Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Physical Vapor Deposition (PVD) processes. It is an intuitive, advanced system that enables users to deposit thin films layers quickly and precisely on high-temperature substrates, such as glass, glass ceramics, plastics, and metals. 3120 unit includes two independent, yet simultaneous sputtering sources, three rotatable targets, two creep chambers, and one e-gun source of magnetron sputtering. The simultaneous operation of two sources of magnetrons in the chamber helps to maximize process yields and reproducibility. In addition, the chamber and components are designed to reduce chamber evacuation time and optimize deposition rates on larger areas. VARIAN 3120 also includes a large high-vacuum chamber that is designed to maintain even and optimal cleaning at all times, resulting in a very clean and smooth surface for the deposition of thin-film layers. 3120 machine has a host of features that enable users to quickly change between sputtering and other processes, including ion implantation, electron-beam or laser melting, and thermal oxidation. The user can use the tool to control the process parameters, such as target current density, oxygen doping level, substrate bias and temperature at all times. VARIAN 3120 also includes advanced safety features, such as an interlock asset that ensures that the model is safe to operate. The equipment is enclosed in an unloaded air conditioner to keep the chamber temperature and pressure constant. 3120 also provides very high-resolution imaging, allowing users to view, edit, and analyze images using its user-friendly graphical user interface. This interface allows users to quickly adjust synthesis parameters to fine tune the film layers. Finally, VARIAN 3120 system can be easily integrated into automated systems and factory environments. The unit works in a wide range of process conditions, with temperatures of 200°C and pressures of up to 5E-6 Torr. This makes it an ideal choice for mass production runs.
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