Used VARIAN 3120 #9070954 for sale

Manufacturer
VARIAN
Model
3120
ID: 9070954
Electron beam evaporator CHA 1000 Style bell jar: Diameter: 24" Tall: 30" TEMESCAL CV 14 Power supply 14 kVA Dual TC / Ion gauge Auto / Manual valve controller Diffusion pump Mechanical pump.
VARIAN 3120 is a sputtering equipment designed for the deposition of thin film materials on substrates such as metal, plastic, glass and other materials. It enables the precise and uniform deposition of a variety of thin film materials such as oxides, nitrides, carbides, metals and metal alloys. The system is composed of a base unit, an isolated vacuum chamber, and a number of fully featured and interconnected sub-systems. 3120 base unit contains the power supply and control modules. It allows users to select the desired sputtering pressure and to adjust the power levels. In addition, the base unit also includes components for temperature control, including two water-cooled heat exchangers and four PID controllers. The vacuum chamber is isolated, which minimizes contamination and helps to maximize film adhesion. It is constructed out of stainless steel and contains several independent components to ensure tight vacuum seals. These components include a turbo molecular pump with an optimum pumping speed, gate valves, a VCR ferrule, flanges, a pressure gauge, and a needle valve. VARIAN 3120 has a fully automated and configurable RF matching network. This RF matching network enables users to adjust the impedance of the RF power delivery unit in order to establish correct electrode matching at any sputtering pressure. The RF power is delivered to the sample via three independent RF sources. Furthermore, the machine also has a cathodic arc source and gas injectors for use with reactive gases. 3120 is designed with safety in mind. It is equipped with several independent safety features, including pressure and temperature monitors, a dry scroll vacuum pump, and an array of safety interlocks. Additionally, the tool is further protected by keeping all hazardous gases and sources stored outside of the evacuated chamber. In conclusion, VARIAN 3120 is an advanced and fully configurable sputtering asset designed for the deposition of thin film materials on a variety of substrates. It is equipped with an isolated vacuum chamber, multiple independent safety features and components for precise temperature and power control. The RF matching network enables users to adjust the impedance of the power delivery model for optimal matching.
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