Used VARIAN 3120 #9191951 for sale

VARIAN 3120 sputtering equipment has a distinct place in the world of thin-film deposition technologies. It is specially designed for etching and coating of various materials such as metals, oxides, nitrides, and dielectrics in order to produce thin films of superior optical, electrical, and mechanical properties. This sputter system features three independent chambers: a dual magnetronsource chamber, a planar sputter chamber, and a substrate holder chamber. The dual magnetron source chamber uses a TEM type dual magnetron source that enables both planar and angle sputtering. The planar sputter chamber features a tilted mag-source designed to optimize sputtering of high aspect ratio features. The substrate holder chamber has adjustable holders that can accommodate substrates of a variety of sizes and shapes. 3120 unit has a unique load lock machine that enables substrates to be loaded quickly and conveniently into the tool. The load lock asset features a highly uniform pressure and temperature control for improved uniformity of the thin-film coating. The whole model is further controlled using an intuitive computer interface that allows users to set-up parameters or programs without much hassle. This sputter equipment is an excellent choice for a variety of sputter requirements, including the production of optically-thin transparent conductive oxide layers and the selective deposition of dielectric barrier layers. VARIAN 3120 is also equipped with advanced electronics, enabling precise control over the substrate's temperature, material flow, and other parameters. It also has a built-in safety system that shuts down the unit in case of an emergency. Overall, 3120 sputtering machine offers unparalleled flexibility, convenience, and control when it comes to depositing thin films of various materials. It is a reliable and cost-effective choice for scientists and engineers looking for a high-quality sputter deposition tool.