Used VARIAN 3125 #127886 for sale

VARIAN 3125 sputtering equipment is an advanced thin-film deposition system designed to deposit thin films for high resolution materials processing applications. The unit is made up of an advanced vacuum chamber, multiple magnetron sputtering sources, and a powerful control machine. The chamber offers a wide range of vacuum pressure ranges and size, enabling the deposition of thin films with superior throughput, flexibility and control. The tool's magnetron sputtering sources combine a high power RF asset, bipolar magnet design and multiple cooling layers in order to deliver superior sputter deposition processes. The flexibility of this technology allows customers to tune key parameters such as sputter rates, ion bombardment, temperature, power, and target rotation - all of which influence the thin film deposition process. 3125's control model is optimized for comprehensive materials and process control. Its advanced automation capabilities enable the user to develop, execute, and monitor thin-film deposition and measurement processes. Additionally, the control equipment can interact with external devices, interface with various software platforms, and capture data from multiple sources. Finally, VARIAN 3125's chamber is designed to maximize surface area, minimize particle circulation and minimize deposition pressures. This helps ensure high quality films are deposited onto a variety of substrate materials. The chamber is further equipped with an active environmental control system that regulates temperature, humidity, pressure and cleanliness, enabling precise and repeatable control of the process environment. Overall, 3125 sputtering unit is a powerful and reliable tool for high resolution materials processing applications. Its sophisticated design and powerful control machine allow users to achieve precise and repeatable thin film depositions with maximum efficiency and accuracy.