Used VARIAN 3125 #9082989 for sale

VARIAN 3125 is a Sputter Ion Pump (SIP) that is designed to provide researchers with an exceptionally low budget laboratory plasma equipment. This system is known as a "micro-plasma" unit due to its size, and is ideal for research that requires very fine control over the deposition parameters. The machine includes a 3125 Sputter Ion Pump with a gold anode, copper source (target) and a target-to-substrate distance of 4mm. The SIP is designed to generate low-energy plasma to sputter ionized gas species (such as hydrogen or nitrogen) onto a substrate sample. This process transfers material from the target to the substrate, coating it in a thin uniform layer. The tool is operated with a variety of settings. The anode voltage sets the emitted ion energy and the thermionic emission current density, while the source voltage controls the target electrode discharge process. The distance between the substrate and the target governs the velocity of the generated ions and thereby the proportion of target material reaching the substrate. VARIAN 3125 is a closed-cycle, pressurized asset, meaning that no external gases are needed for operation and there is no risk of contamination to the sample. This also eliminates the need for costly and time-consuming maintenance and refilling of gas supplies. The model is capable of reliable sputter action over a range of 0-2mm of target-to-substrate distance, with a maximum recommended distance of 4mm for single target deposition. 3125 is especially useful when depositing low-temperature, low-mass and low-level material onto a sample without the possibility of damage or contamination. For example, the equipment is often used to deposit sample coatings onto a variety of substrates including glass, ceramics and alloys. Additionally, this system is highly recommended for nanoscale deposition or fine-tuning of electrical and optical properties of samples. VARIAN 3125 Sputter Ion Pump is a compact unit with precise features that make it ideal for research applications which require top-notch performance with a low budget. Its small size, wide range of operating settings, and reliable sputtering process make it a valuable tool for research laboratories all over the world.