Used VARIAN 3140 #9046098 for sale

Manufacturer
VARIAN
Model
3140
ID: 9046098
Sputtering tool X3 4" Sputter Gus with Planetary.
VARIAN 3140 is a sputtering equipment capable of providing advanced materials deposition performance. It is a fully automated process and utilizes an independent, precision dual-zone vacuum chamber. The chamber helps to maintain superior vacuum integrity and superior uniformity over a wide range of pressure and temperature factors. The system is also equipped with a quartz effusion cell that enables the delivery of high-quality materials onto the surface of a substrate. The unit is suitable for the deposition of a wide range of materials, including metals, alloys, and compound materials, through sputtering process. The main components of 3140 machine are the two-zone vacuum chamber, the vacuum tool, a motorized manipulator, a gas feed asset, the Quartz effusion cell, and the sputtering sources. The heart of the model is the two-zone vacuum chamber which allows for dual-zone process control and uniformity. The highly efficient vacuum equipment pedestal pumps maintain a clean environment in the chamber at all times. The flexible motorized manipulator allows for the easy loading and unloading of the substrate, as well as precise positioning of the substrate for sputtering process. The powerful gas feed system and the quartz effusion cell enable the delivery of high-grade materials on the substrate with high uniformity. The Quartz effusion cell helps to reduce impurities and allows for better control of the process. The high-speed, high-precision sputter sources allow for high throughput rates with superior uniformity and superior process control. VARIAN 3140 unit offers both high accuracy and flexibility to meet the most demanding production requirements. The dual zone process control enables excellent uniformity over the full range of pressures and temperatures, while the quartz effusion cell provides the perfect environment for depositing high-grade materials with minimal impurities. The sputter sources and the gas feed machine enable high throughputs with excellent process performance. Additionally, the motorized manipulator allows quick and easy loading and unloading of substrates for efficient production.
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