Used VARIAN 3180 #293827838 for sale

Manufacturer
VARIAN
Model
3180
ID: 293827838
Wafer Size: 4"
Sputtering systems, 4" D16B Pump (8) Cryopump CTI CRYOGENICS 8200 Compressor Power supply rack Silicon Carbide (SiC).
VARIAN 3180 sputtering equipment, manufactured by VARIAN, is an all-in-one versatile system that applies uniform thin coating on flat substrates. It is ideal for research and development in many different industries, such as microelectronics, energy storage and displays, because it allows a wide range of materials to be coated, including metals, alloys, oxides, and dielectrics. The unit consists of a base unit and a number of other components, including an ion source, a pulse power supply, a gas feed machine, and a sputter chamber. The ion source uses an RF or DC glow discharge to create a positive or negative ion beam that orients the sputtered atom species in a particular direction. The pulse power supply is used to control the pulse rate and pulse width, which helps in optimizing the film growth rate. The gas feed tool is used to inject reactive gases, such as Argon, O2, Ar-O2, or N2 mixtures, which are then ionized by the ion beam and cause additional ion bombardment of the substrate. This improves mechanical and chemical adhesion of the sputtered material and reduces contamination from particles on the substrate. The sputter chamber is capable of achieving high vacuum conditions, which is necessary for producing a stable and uniform deposition of the coating material onto the substrate. The substrate holder is motorized for sample exchange and can easily be re-positioned. The asset also offers a wide range of control parameters related to temperature, direction, and pattern of the beam, rate of sputter deposition, and RF power. It is also possible to monitor and control the chamber pressure and gas flows. In order to obtain a uniform film of the desired material on the substrate, 3180 sputtering model offers excellent uniformity and repeatability. It is equipped with an automated sputter gun and offers superior film thickness uniformity and run-to-run repeatability. The film thickness uniformity across the substrate is within +/-0.2 μm, and the typical uniformity across the sample is within +/-0.5 μm. This ensures that the substrate is optimally coated with the desired material. VARIAN 3180 sputtering equipment is a reliable, easy-to-use, and efficient system for thin-film deposition. It allows users to apply uniform coatings to substrates with high yield and consistent quality. It is one of the most reliable and flexible sputtering systems on the market, making it ideal for a range of research and development applications.
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