Used VARIAN 3180 #83197 for sale

Manufacturer
VARIAN
Model
3180
ID: 83197
Wafer Size: 4"
Sputtering system, 4" (2) Conmag targets Mini quantum target Pre-heat / Degas station EUROTHERM 808 Backside wafer heater Tiw station shielding to prevent particle contamination Source isolation shielding to prevent particle contamination Backside air system replaced with NUPRO iso valves and VCR connections DC Power supply remote meter, digital (2) Wafer cassettes, 4" Standard VARIAN controller VARIAN 919 IG Controller FLUKE 1722A Process controller with SD card reader to replace floppy drive AGILENT / HP / HEWLETT-PACKARD / KEYSIGHT 3438A Multimeter MKS 250B Gas controller with MKS 248 valve assembly (3) Gas systems with MKS MFC and 247 controller VARIAN 880 Ion gauge controller CTI CT-8 Cryo pump with compressor VARIAN Cryo temperature monitor LEYBOLD D-30 Mechanical pump (3) ADVANCED ENERGY MDX DC Power supplies PLASMATHERM 1000W RF Generator Handling system with etcher, 4" 10 kW Power supply for Cu 5 kW Power supply for Tiw.
VARIAN 3180 is a Multi-Target DC Magnetron Sputtering Equipment designed for a variety of applications including film deposition, coating, and surface treatment. This sputtering system uses magnetic fields to create energetic ions that are used to deposit thin films on a substrate. The unit features state-of-the-art control software and hardware that enable it to provide precise and repeatable process results. 3180 features an integrated, low-maintenance duoplasmic ion source, which has several advantages over conventional plasma sources, including a low cost of ownership and maintenance, low- levels of processing waste, and a more consistent deposition of films across a wider range of substrates. The features also ensure that the high quality of the films achieved is consistent and repeatable. The DC Magnetron Sputtering machine is also equipped with an integrated, robust high-rate power supply, which enables it to achieve higher rates of deposition than other systems on the market. This ensures faster process cycle times and greater process repeatability. The tool offers a variety of sputtering targets that are designed to meet the requirements of specific materials characteristics. The targets are designed to be durable and offer long-term reliability and performance. The asset also has retractable carbon-and-graphite cathodes, which allow for a wide range of substrate materials to be used with the model and provide superior quality results. VARIAN 3180 is also backed by VARIAN multi-target DC magnetron sputtering equipment warranty, which protects the system's components should any of them fail during normal use. This warranty comes at the cost of a nominal fee, which is calculated based on the unit's size and feature levels. 3180's control software offers a wide range of options for user customization. Users can customize their machine settings to control the target size, shape, location, and position, as well as the current and bias settings. The software also allows for custom recipes and programs to be created, enabling users to quickly and accurately replicate their processing conditions. Overall, VARIAN 3180 provides users with a high-quality, cost-effective, and reliable sputtering tool. Its duoplasmic ion source, robust high-rate power supply, and broad range of sputtering targets allow users to deposit thin films of material onto a wide range of substrates with excellent repeatability, while its control software and hardware offer users extensive user control options. The asset is backed by VARIAN multi-target DC magnetron sputtering model warranty, ensuring that components are covered should they suffer any damage during normal operation.
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