Used VARIAN 3180 #9004072 for sale

VARIAN 3180 is a High Rate, Direct Current Sputter Equipment designed for modern thin film deposition applications. It is primarily used in industries such as semiconductors, data storage, optics, and industrial coatings. The system features a 3.4 cm3, 24-liter vacuum chamber that is ideal for coating small planar substrates or large circular substrates, while maintaining relatively high processing rate. Its magnetron sputtering sources included three lanthanum hexaboride (LaB6) and five tungsten (W) targets with a power density of up to 1000 W/cm2. 3180 also features a power supply module capable of generating a wide range of direct current (DC) bias voltages from 0-1000 Volts. This allows for precise modulation of material deposition qualities such as deposition rate, energy, and physical characteristics. As an added bonus, the power supply provides a removable Fibremate target release unit for low-pressure power delivery. The machine also features a substrate temperature-control option. This is accomplished by introducing a gas flow assisted uniform heating within the chamber during deposition; allowing for uniform, low-temperature deposition. The maximum temperature range is adjustable from 20˚C to 400˚C. VARIAN 3180 offers two controllable gas line inlets which allow control of deposition parameters such as dwell times, flow rates, and gas chemistry. This option makes the tool incredibly versatile in a variety of thin film deposition applications. Finally, 3180 boasts a sophisticated graphical user interface (GUI) on its touch-screen display. This GUI provides a user-friendly interface with real-time monitoring of asset performance and performance metrics. The GUI is designed to streamline thin film deposition processes, making it easier to identify optimal process parameters. Overall, VARIAN 3180 sputter model offers versatile features and options designed to simplify thin film deposition processes. With its precisrDC bias voltage capabilities, 50W/cm2 power density, programmable substrate temperature control, and robust user interface, the equipment is an ideal choice for small and large scale thin film deposition applications.