Used VARIAN 3180 #9077094 for sale

VARIAN 3180
Manufacturer
VARIAN
Model
3180
ID: 9077094
Wafer Size: 4"
Vintage: 1987
Sputtering system, 4" With S/E (3) Guns Datatrak controller (3) 12 Kw DC P/Ss CT-8 Cryo pump RFPP RF-10S 1987 vintage.
VARIAN 3180 is a high-performance sputtering equipment designed for ultra-high purity and repeatable results. It is a compact, reliable and robust system that offers excellent process control and uptime. The unit consists of three independent sources, a three-target, mid-frequency powered sputtering chamber, an independent twin-target, low-frequency powered sputtering chamber and a control and power supply unit. The independent twin-target sputtering machine offers optimum process control and excellent uniformity in the deposition of thin metal films on substrates. The low-frequency power and control unit offers precise control of the parameters required to achieve consistent deposition. The three-target configuration allows for multi-layer metal and culm deposition with exceptional uniformity, while the independent sputtering chamber offers flexibility in terms of application specific features. The power source of 3180 is a mid-frequency AC source, which provides higher power and uniformity than typical low-frequency DC sources. The three-target configuration offers maximum control over the target powers, allowing for precise adjustment of the film properties at each target, resulting in repeatability and process control. The chamber itself offers a unique ceramic wall-liner technology which ensures a uniform deposition across the entire surface, resulting in excellent uniformity. The design also eliminates interference from particles, resulting in higher uniformity. The control and power supply unit allows for industry-standard, user-friendly process control, ensuring consistent, uniform film deposition and repeatability. The unit also features comprehensive safety features and a comprehensive set of diagnostic and process monitoring features. VARIAN 3180 is a highly reliable, versatile tool that provides the highest degree of process control and uptime. It is a reliable, repeatable and reliable sputter deposition asset, which offers excellent process control and simplicity. It is ideal for thin-film deposition and is an excellent choice for small and large-scale production applications.
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