Used VARIAN 3180 #9238713 for sale

VARIAN 3180 is a versatile DC-sputtering equipment designed for deposition and etching of a variety of materials. It utilizes permanent magnet sputtering technology to create thin films with enhanced uniformity and increased adhesion strength. This technology also enables the deposition of complex multilayer stacks with precise molecular layering control. 3180 is fully automated for process repeatability and greater throughput, and it is equipped with two magnetrons and two target assemblies, independent or combined amps for each target assembly, tube chamber for thermal sputtering, optional storage chamber, and an intelligent diagnostic system. VARIAN 3180 has the capability to deposit a wide range of materials including but not limited to dielectric, metallic, semiconductor, ferromagnetic, and insulating materials. It can perform a variety of applications such as deposition of optical and electrical materials, protective films, chemical etching, etching for design modifications, and more. The constant power supplies, adjustability of power to each cathode, and target temperature control enable this unit to optimize the deposition of high-quality films. 3180 consists of a 6-inch diameter chamber which has three chamber walls, each with multi-slit collimators. The top wall enables the deposition of materials on the substrate, the bottom wall helps to evacuate the chamber, and the middle wall helps with vertical alignment of the target. The chamber is equipped with independent helium purge and double-click for the reduction of oxygen concentration in the process. The capability to continuously vary pressure during deposition from 0.001 mbar to 1.3 mbar helps to precisely tailor the process parameters and optimize the deposition rate, film thickness, and substrate uniformity. A wide range of process control techniques are also available, including variable power, target temperature control, and substrate rotation for improved film performance. The integrated PC-based controller offers extensive recipe storage, process monitor and control, real-time diagnostic control, and data logging capabilities. Additionally, a computer-controlled substrates positioning machine ensures precise substrate location. VARIAN 3180 has a 4-turn quartz crystal monitor for film thickness measurement, as well as an in-situ and ex-situ reflectivity measurement tool for the real-time monitoring of the deposition process. The asset is also equipped with an ultrasonic bath for cleaning of sample parts prior to coating and a quartz cell for electrical conductivity measurements. Overall, 3180 provides the most efficient deposition, etching, and ion milling capabilities in a single model, making it suitable for a wide range of applications. Its features enable controlled deposition of films with high quality and uniformity in high throughput.