Used VARIAN 3190 #42672 for sale

VARIAN 3190 sputtering equipment is an advanced, high-performance physical vapor deposition (PVD) system designed for research and industrial applications. With a maximum process temperature of 1400°C, and a range of process pressures from 10^-2 to 10^-7 Torr, this highly versatile and reliable unit can optimally execute a wide range of coating processes and thin-film deposition applications. The machine is comprised of two interconnected chambers, the top chamber housing the sputtering target assembly and the lower vacuum chamber containing the substrates. The sputtering target assembly can accommodate up to three independent target sources configured with either an RF or DC sputtering source. Additionally, the targets can be customized to the desired coating material, allowing for the deposition of metals, alloys, oxides, and dielectrics. 3190 employs advanced Substrate Bias Control technology, allowing for precise control of substrate potential and precise uniformity. This technology also makes it possible for independent control of the sputtering deposition parameters for each target, further increasing uniformity of the finished product. Moreover, the tool includes an advanced multi-zone heating and cooling platform, allowing for precise temperature control of up to five combustion zones, ensuring superior quality and repeatability of deposition results. When combined with VARIAN web-based Optima software platform, VARIAN 3190 offers complete control over the sputter deposition process, allowing for significant optimisation of the end result. This intuitive interface also allows for complete monitoring of process parameters, enabling precise process diagnosis and troubleshooting. Furthermore, the asset also features an advanced process diagnostics tool, which makes it easy to identify any problems and take corrective action in real time. In short, 3190 is a powerful and intuitive PVD model with state-of-the-art features designed to optimise thin-film deposition processes. The equipment offers unparalleled process control and precise substrate uniformity, making it an ideal platform for a wide range of industrial and research applications.