Used VARIAN 3190 #9105395 for sale
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ID: 9105395
Wafer Size: 4"
Sputtering system, 4"
Standard system
Includes:
RF Etch
RF10S power supply.
VARIAN 3190 is a sputtering equipment designed for a variety of sputtering processes. It is comprised of a mainframe system that incorporates a chamber, a vacuum unit, and a deposition source, as well as a 4-axis load lock control panel, a positioner, and a power supply. The chamber and vacuum machine of 3190 provide an optimal environment for analyses based on sputtering. It uses a turbo pump and a 7-orifice rotary pump for vacuum levels down to 2x10-4 Torr. In order to achieve the desired vacuum, a vacuum line and valve are used to isolate the chamber from the pumps. The deposition source is a Planetary Deposition Source that makes it possible to deposit material onto several substrates simultaneously. It works by creating a rotating field which results in the sputtering of near-monolayers onto the substrates. This happens when a combination of a gas species and a noble is used for sputter deposition. The 4-axis load lock control panel of VARIAN 3190 makes it possible to load, unload, move and position multiple substrates within the chamber. It works by taking advantage of independent linear actuators mounted on the three axes, to maintain precise control over each substrate's position. The tool also includes a positioner and power supply that provide extra control and stability to the deposition process. The positioner gives the asset access to a wider range of angles and makes possible to position the substrates to the exact location needed to complete the job. Finally, the power supply offers various power levels up to 1000 Watts. In sum, 3190 is a powerful sputtering model that offers an outstanding level of accuracy and control for a variety of applications. With its advanced tools and features, it is ideal for a range of processes, and it is capable of delivering high-quality sputtering results.
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