Used VARIAN 3190 #9132592 for sale

VARIAN 3190 sputtering equipment is an advanced laboratory instrument used in the physical vapor deposition (PVD) of inorganic coatings on various materials. This system features a vacuum chamber used to create a low pressure atmosphere, and an open process chamber for sputtering. It also includes a high power radio frequency (RF) generator, a variety of process and installation accessories, and an easy-to-use graphical user interface (GUI). 3190 is designed to provide consistent sputtering deposition rates and excellent reliability. VARIAN 3190 sputtering unit is a simple laboratory instrument that provides high-quality sputtering deposition rates. This machine works by heating a target to a high temperature and using RF energy to create a direct current in the chamber. This current vaporizes both the solid material from the target and the gas released in the process. The atoms of these materials then travel through an electric field to the substrate material, where they rapidly deposit. 3190 has several features that make it an ideal sputtering tool. First, its open-process chamber design allows for flexibility in processing different materials with varying thicknesses. Second, the asset has a computer-controlled process control model that allows users to precisely monitor and adjust the equipment's pressure, temperature, and deposition rate. Third, the system is equipped with a high-power RF generator that provides excellent mechanical stability and uniform thickness of coating on the substrate material. VARIAN 3190 is also well-suited for a variety of sputtering applications including metal, insulator, and semiconductor films. This unit is designed to provide consistent sputtering rates for different applications. This flexibility allows users to continually adjust the deposition rate to achieve the desired thickness and quality of the coating. Additionally, the precision of process control also allows for consistent reproducibility of results. Overall, 3190 sputtering machine offers excellent sputtering deposition rates and flexibility. Its open-process chamber design, computer-controlled process control tool, and high-power RF generator make it an ideal solution for a variety of applications. The asset is easy to use, and its consistent deposition rates and reproducibility of results make it a reliable choice for many sputtering deposition experiments.