Used VARIAN 3290 STQ #9250098 for sale

VARIAN 3290 STQ is a state-of-the-art sputtering equipment designed to deposit thin films of materials onto substrates. This sputtering system is capable of depositing a wide range of materials including, but not limited to, aluminum, chromium, nickel, titanium, tungsten, copper, and silver. VARIAN 3290STQ is a multi-magnetron unit capable of depositing up to four materials simultaneously and is highly configurable depending on the application needs. The unique design of the machine allows for exceptional uniformity and repeatability in deposition rate, film thickness, and layer composition. The exposed components of 3290 STQ are constructed of strong, ultra-rigid stainless steel, providing superior mechanical stability and minimizing vibration. The chamber is hermetically sealed and includes a true vacuum pumping station in addition to high-tech sputtering sources. This tool also incorporates an advanced on-board monitor with a computer interface for maximum control and automation, while a built-in user friendly control asset allows for easy sputtering runs. The depositing process starts with the sputtering of the desired material from the high-energy magnets carefully arranged in the magnetic array. The array allows for efficient sputtering and deposition of the material while preventing it from simply diffusing into the chamber. The material is then collected onto the substrate by the pumping station which vacuums it away from the sputtering source and across the substrate. This ensures uniform and repeatable deposition of the film onto the substrate, resulting in high quality, consistent thin films. 3290STQ is ideally suited for sputter-coating and related high tech processes in a variety of industries and applications. Examples include semiconductors, optical-electronic devices, hall sensors, thin film coatings, and many other technologies that require thin film materials. Furthermore, with its impeccable precision and accuracy, VARIAN 3290 STQ offers an industry standard for the reliable and consistent deposition of thin films.