Used VARIAN 3290 #9043983 for sale

VARIAN 3290 is an automated sputtering equipment manufactured by VARIAN Technologies Inc. It is a high pressure, low temperature coating system for the accurate and efficient deposition of thin films. This unique unit is capable of producing high quality, repeatable, layer-by-layer films with precise composition and uniform thickness. The machine is composed of an automated sputtering target, substrate wafer handler, RF/DC power supply, vacuum tool, and a gas panel. The sputtering target is a heteroepitaxial structure. The target material (usually metals, semiconductors, or superconductors) is sputtered onto the substrate (usually a silicon wafer) in a well-controlled environment with clean vacuum and high purity carrier gas. Sputtering is an advanced film forming deposition process in which a thin film of metal is formed through the bombardment of a target surface with a stream of high speed thermionic particles. The RF/DC power supply offers high DC and RF power levels, combined with excellent control and stability. It provides precise control of substrate temperature for the uniform deposition of thin films. A gas panel is connected to the asset to introduce and control the carrier gas during the sputtering process. 3290 model also features a facility to produce a plasma environment by introducing RF energy to the deposition chamber. The typical operating parameters of this equipment are high chamber temperature up to 1000°C and low voltage up to 1000 Volts, allowing for deposition of thick films, but precise control of thin film deposition. The vacuum system of VARIAN 3290 consists of a vacuum chamber connected to a pump. The pressure in the chamber is controlled to humidity level below 10-4 to maintain the purity of the environment for uniform and quality film thickness. 3290 is a reliable and efficient unit for producing high quality thin film layers with precise composition and uniform deposition thickness. The automated sputtering feature ensures consistent results with repeatable output, making it an ideal choice for a range of thin film applications. The advanced features of this machine makes this an excellent choice for research and industrial use.