Used VARIAN 3290 #9236340 for sale

VARIAN 3290 Sputter Equipment is a piece of equipment for the deposition of thin films of metal, dielectric, or insulative materials on various substrates. This is most often used for precision thin film coating applications in the semiconductor industry, hard disk drive production, electronics assembly, and other micro-fabrication processes. 3290 Sputter System is a single chamber, high vacuum deposition unit capable of depositing thin films in an ultra-high vacuum environment with extremely low process ion contamination. It is designed using the Cel Chamber technology (inert gas sputtering) which helps maintain a stable and high deposition rate. This machine has eight Cel Chamber sources that can accommodate up to twelve material targets. It has a broad array of process chamber options including cryo-pumping, rotary substrates and silicon stepper for precise uniform film deposition and wafer alignment. The tool features a digital process control and data logging which allows users to precisely monitor deposition parameters and record the data for subsequent analysis. This helps ensure repeatability and accuracy in the thin film deposition process. Additionally, the asset is equipped with an integrated process control model that can be used to monitor key process parameters such as vacuum pressure, deposition rate, and temperature. VARIAN 3290 is also equipped with an optional contamination monitor, which provides real-time feedback of deposition conditions such as process gas lines, process pressure, substrate topography and flux uniformity. Other options include multiple gas lines for internal or external gas supplies and a Programmable Vaporized Source (PVS) chamber. In summary, 3290 Sputter Equipment is a high-vacuum deposition system designed for precision thin film coating applications in the semiconductor industry. It is equipped with a digital process control unit and data logging to ensure repeatability and accuracy in the thin film deposition process. It is capable of depositing thin films of a variety of different materials in an ultra-high vacuum environment with extremely low process ion contamination. Furthermore, it is equipped with an integrated contamination monitor and various features such as cryo-pumping, rotary substrates and a PVS chamber. All of these features make VARIAN 3290 an ideal choice for thin film deposition.