Used VARIAN 3290 #9236357 for sale

A VARIAN 3290 sputtering equipment is a versatile tool for deposition of thin films of materials onto a substrate. Developed by VARIAN Inc., 3290 is a single-chamber system capable of performing both standard sputter deposition and sputter-etch processes. It is equipped with an easy-to-use ion source, which uses a focused beam of argon atoms to sputter metal or other material targets at up to 6 cm in diameter. VARIAN 3290 is a highly reliable unit that allows for fast deposition rates of up to 35 nanometers per minute. 3290 features excellent control of process parameters such as deposition rate, ion current, ion energy, and gas and pressure control. The machine's controller can easily be programmed to ensure precise control of the deposition process. VARIAN 3290 can also be used to clean the substrate surface prior to sputtering, through automatic plasma cleaning operations, which can be easily monitored through the tool's controller. 3290 supports a variety of measurements and diagnostics, such as in-situ ion current and temperature measurements. This allows for accurate and consistent deposition of thin films, without the need for additional metrology equipment. Additionally, VARIAN 3290 has an intelligent process chamber designed for maximum ionization efficiency and sputter rate uniformity across the entire target. 3290 is also highly efficient in terms of power consumption. It only requires a single 13 AMP supply in order to operate, making it perfect for applications where space is a rare commodity. Additionally, VARIAN 3290's process chamber can easily be isolated, sealed off, and ventilated in order to achieve optimal safety and performance. Overall, 3290 is an excellent sputtering asset, capable of providing high-quality films at fast deposition rates. It has powerful process control capabilities, energy-saving construction, and the ability to perform both standard sputter deposition and sputter-etch processes. VARIAN 3290 is an ideal choice for anyone looking for a reliable and efficient model for their deposition needs.