Used VARIAN 3290 #9236362 for sale

Manufacturer
VARIAN
Model
3290
ID: 9236362
Sputtering system Interlock status chassis / tsvr01.
VARIAN 3290 is an industrial sputtering equipment used for the deposition of thin films onto various substrates. This system can deposit a range of thin-film materials including metals, oxides, semiconductors, and insulators. It is equipped with an enclosed, large sputter target of different sizes and shapes, which is typically made up of the material that needs to be deposited. It has a magnetron sputtering cathode equipped with either a single- or multiple- target sputtering capability and a planetary motion capability for spinning and indexing the target sputtering technique. The sputtering cathode is composed of a vacuum chamber, target substrate, and a magnetron source for ionizing the gas. The vacuum chamber allows for the gas to be introduced into the chamber and the target substrate acts as the top surface for the sputtering process. The magnetron source creates a high vacuum inside the chamber ensuring that the gas molecules and negative ions are able to travel unimpeded through the chamber. This sputtering unit also uses an ultra-high-vacuum machine for optimal performance and to prevent contamination. The tool has a three-axis manipulator to position the substrate holder for sputtering that can be configured to allow for uniform coverage, high speed, circular or offset circular motion. It also has a programmable front-to-back ratio to control sputter erosion and feature control. The variable programmable table provides up to three predefined areas of control, allowing users to customize material of the substrate and sputter deposition pattern. An inductively coupled plasma source is also incorporated in the asset for additional versatility, allowing for precision. To ensure uniformity, 3290 uses a three-dimensional particle size monitor, controlling for particle shape and particle size. In addition, the model uses quartz crystal thickness monitors for accurate deposition control and optical emission spectroscopy and mass spectrometry for ongoing process control. Overall, VARIAN 3290 is an advanced equipment with high-performance capabilities for precisely sputtering thin films on a variety of substrates. This provides customers with an efficient and effective solution for substrate deposition, allowing for maximum accuracy and control.
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