Used VARIAN 3290 #9236365 for sale

VARIAN 3290 is a cutting-edge sputtering equipment designed to meet the needs of semiconductor and thin film users. The system is capable of thin film deposition of a variety of materials, such as metal, dielectric, silicon, and semi-conductors, using either low-pressure sputter deposition or ion beam sputter deposition techniques. There is also a companion unit, VARIAN 3300, which is designed for ultra-high-vacuum processes and enables faster deposition rates. 3290 features a modular design, allowing it to be reconfigured to meet a variety of needs. It can be easily configured with a variety of rotating and tilting magnetron configurations, enabling the deposition of oxide, nitride, and metal films on various substrates. The powerful electromagnets within the machine allow for high-density and uniform deposition rates. VARIAN 3290 is also equipped with two different types of cathode-based direct-current (DC) power supplies: the standard dry power supply and the more powerful wet power supply. The dry power supply offers superior deposition characteristics, as it is highly efficient and allows for narrow current pulses. The wet power supply is suited for processes that require higher ionization flux for improved deposits. The tool also features a fully customizable temperature-controlled stage, allowing for precise substrate heating during operational processes. The stage can accommodate various temperature profiles to ensure optimal deposition of thin films on the substrate. In addition, 3290 can accommodate a wide variety of substrates, from intricate nanomaterials to large-area microelectronic substrates. Additionally, the asset is equipped with two distinct load locks for efficient substrate transfer and cleaning processes. The load locks are designed with an advanced cooling model, that ensures the precise control of temperatures throughout the equipment. This cooling system also helps protect the sensitive components in the unit from mechanical stress. Overall, VARIAN 3290 is a highly customizable sputtering machine, engineered for the precise deposition of thin films across a variety of materials and substrates. At the same time, its modular design and advanced components allow for maximum efficiency and control during operations. The tool is ideally suited for a wide range of semiconductor and thin film applications.