Used VARIAN 3290 #9236371 for sale

VARIAN 3290 is a noble gas sputtering equipment used for the deposition of thin films used in the most demanding thin film deposition applications. It typically consists of a DC or pulsed magnetron sputter source, a unique substrate-supporting platform which enables repeatable mating between the substrate and source, and efficient vacuum pumping system with instrumentation and interlocks. The unit typically consists of a large cylindrical chamber fitted with a top-mounted sputter target which is arranged around a substrate-supporting platform. This platform can move up and down to precisely match the target-substrate distance in a highly repeatable manner and depending on the application enables deposition of up to 3 substrates at once. The chamber is designed to operate at ultra-high vacuum (UHV) pressures of 2 x 10^-9 Torr, or better. A turbomolecular pump (TMP) is used to generate the UHV conditions. The sputter source is either a DC or pulsed magnetron which enables excellent control of deposition rate and composition (e.g. Ti/Al oxide films). The DC or pulsed target is fitted with shields which improve etch rate uniformity and can also be tilted in some systems to aid in uniformity. Special cathode mounting is also used to keep the target from being shorted to the chamber walls and ensure reliable operation. Finally, 3290 is equipped with process monitoring and control instruments for rotation and tilt of the substrate, current and voltage to the target, mass spectrometer for monitoring chamber pressure, automated substrate alignment and adaptable thermal heaters to enable temperature control of the substrate. In summary, VARIAN 3290 is a powerful sputtering machine for the deposition of high quality, reproducible thin films. It is favoured in many demanding thin film deposition applications such as optical coatings, semiconductor and MEMS device fabrication and OLED display manufacturing.