Used VARIAN 3290 #9376019 for sale
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VARIAN 3290 is a high-end sputtering equipment designed to be used in advanced thin film deposition processes. It utilizes rotatable substrates of up to 5 inches in diameter, allowing for precise uniform thin film deposition in any given direction. It is often used in advanced research and development applications, such as the depositing of Gallium Arsenide films, as it offers a superior range of control over traditional systems. 3290 has a range of capabilities which makes it the perfect system for high-end sputtering applications. It features four independently controllable cathode power supplies and a simple software user interface. This allows users to easily program all the parameters needed to sputter a wide range of film materials, including Aluminum, Copper, and Titanium. Its highly precise control also allows it to sputter films as thin as 0.1 micron. VARIAN 3290 is also fitted with a number of safety features to prevent accidents from happening. It is fitted with a vacuum interlock unit which shuts down the machine if a vacuum leak occurs. Furthermore, it also has inherent arc suppression, which prevents current arcs from forming and damaging the thin film. 3290 also features an on-board computer machine which enables the data obtained from the sputtering process to be easily analyzed and manipulated. This helps to increase the accuracy and repeatability of the thin film sputtering process. It also offers the ability to store sputtering programs, allowing users to easily repeat thin film deposition processes without configuring the same parameters each time. The versatility, range of features, safety systems, and precision control makes VARIAN 3290 the perfect choice for those who require a high quality and reliable sputtering tool for their application. The ease of programming and the fast sputtering rate of up to 120µm/min further add to its appeal. Ultimately, 3290 is a depreciable but invaluable asset for any research or development project needing advanced thin film deposition.
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