Used VARIAN Chamber for M 2000 #293661352 for sale

VARIAN Chamber for M 2000 is a sputtering equipment designed for thin film deposition applications. It is an R&D grade deposition system capable of deposition over large areas with high consistency and uniformity. The unit is ideal for depositing a variety of materials such as metals, dielectrics, and organics. Chamber for M 2000 features two 6-inch x 6-inch wafer carousels and two 8-inch x 8-inch wafer carousels that are controlled by an intuitive user interface. The machine utilizes a conventional cathode tool and a shielded cathode mechanism to ensure optimal uniformity and repeatability. The wafer carousels are designed to ensure accurate alignment and parallelism of the wafers during sputtering operations. In addition, the asset also features a flexible wafer vacuum source port that can be used to introduce gas sources during sputtering operations. VARIAN Chamber for M 2000 also includes a unique SubSystem 2000 control cabinet designed to maximize the model's performance and utility. The equipment includes a software package that allows for remote access and control of the system from an external PC. This software also offers advanced diagnostics and unit utilities. Chamber for M 2000 utilizes a precision rotary mechanical shutter to provide a uniform deposition rate across the wafer surface without the need for additional protective masks. The machine also has full nitrogen purging capability for fast and efficient cleaning processes. Additionally, the tool features a dry etching option, as well as high-resolution seam detection for efficient quality control processes. VARIAN Chamber for M 2000 also includes a high-output RF power supply with precise control and monitoring capabilities. It also offers a wide range of sputter ion sources for presenting a variety of films. Finally, it also includes a host of other features such as double sided deposition, an adjustable pressure detector, and an acrylic safety window for enhanced safety and efficient operations. In conclusion, Chamber for M 2000 is an advanced, R&D grade sputtering asset designed to efficiently deposit thin films with high fidelity and repeatability. The model also offers a host of additional features such as a SubSystem 2000 control cabinet, a precision rotary mechanical shutter, and a high-output RF power supply to ensure optimal performance.