Used VARIAN E47000454 #9126496 for sale

VARIAN E47000454 is a high-performance sputtering equipment designed for general deposition applications. It is capable of depositing thin films on substrates at high rates over a wide range of deposition parameters. The system uses an inductively coupled argon plasma source to produce highly-uniform and reproducible sputtered films. It features a 7-inch-diameter, 4-position rotary sputtering target, which allows for sputtering of multiple materials. The specialized RF-driven sputtered ion source of the unit provides an efficient way to deposit films with varying compositions on the substrate. E47000454 sputtering machine has a large 4-inch sputtering chamber with a high-flow-rate gas control tool that allows for precise control of the physical parameters of the film. It also features a temperature-controlled substrate heating plate for conformal deposition of films at different temperatures. The asset is compatible with a wide variety of vacuum measurement devices, enabling users to measure the pressure in the sputtering chamber. The model has a programmable logic controller (PLC) to facilitate control of the equipment, allowing for precise and uniform deposition and material usage. VARIAN E47000454 has a robust and energy efficient power supply that provides a maximum deposition rate of up to 5nm/min, while the special inductively coupled sputtering source ensures a uniformity of deposits across the substrate. In addition, it features a DC power supply for DC sputtering, making it possible to deposit films with low corrosive characteristics. Another advantage of this system is the control of process parameters via the integrated software. This control unit makes it possible to replicate prior experiments and to achieve repeatable deposition results. E47000454 sputtering machine has excellent uniformity, high-rate deposition, and versatility. It is ideal for a wide variety of industries, including semiconductor, data storage, solar energy, medical and aerospace. With its numerous advantages, it is an excellent and cost effective solution for the deposition of thin films.