Used VARIAN M 2000 #9246300 for sale

VARIAN M 2000 is a state-of-the-art technology equipment used in a variety of research and industrial applications. It is a powerful sputtering system designed for maximum efficiency with an adjustable target area for precise deposition of films or electrodes. This sputtering unit works by using a suitable gas, usually Argon, which is ionized via the addition of a high voltage bias. A magnetron then projects a fast, focused stream of ionic particles which bombard the target area in order to passivate or coat the surface. The substrate is mounted onto a rotating chuck and consists of a large chamber for production scale coating with a target-holder area that is specifically designed for use in plasma process applications. The main components of the machine include an induction coil, a transformer, an ion source, an RF generator, an exhaust tool and an ion current monitor. All of these parts are integrated into the machine for complete control of the substrate coating process. The main advantages of VARIAN M2 000 compared to other systems include its adjustable power sources, allowing for better adjustment of deposition parameters; reliable operation with low risk of operational failure and increased production throughput; and a variety of chamber sizes which accommodate a variety of substrates. The overall design of M 2000 is simple and rugged with high process quality and a robust operation. This asset has a variety of potential applications, ranging from medical, automotive, industrial, and semiconductor industries. Its various applications includes providing physical and electrical properties to surfaces, thin film deposition, and advanced display manufacturing. In conclusion, M2 000 sputtering model is an advanced and efficient solution designed for many applications and is capable of providing a reliable and uniform coating at a high process quality. It has the benefit of having adjustable power sources and variety of chamber size which make it suitable for most substrates, and robust operation is helpful for maximizing production throughput.