Used VARIAN M 2000 #9277462 for sale

VARIAN M 2000 is a sputtering equipment designed for ultimate process flexibility. It is a high performance system that is ideal for processing a variety of substrates including hard and soft materials, metal thin films, metals, dielectrics, and low-k dielectrics. VARIAN M2 000 features a range of process capabilities and support options. It is equipped with a 3-position load lock, capable of pre-evacuating samples up to 200°C, and is equipped with a high rate sputter cathode capable of high rate deposition of up to 950nm/min. The sputtering process can be tailored to specific desired outcomes, and the unit operating parameters can be optimized for specific processes such as deposition of oxidation-resistant coating of titanium or chrome oxide. M 2000 also comes with a built-in substrate heating and cooling machine, which provides uniform control of substrate temperature during processing, and can accommodate up to four target substrates in each chamber. It also includes a Pulsed Plasma Deposition tool, which allows for a wide range of process options, including rapid sputtering of thin films and uniform impurity control in doping processes. The asset is integrated with a state-of-the-art process control model to ensure repeatable and reliable performance. The software user interface is intuitive and allows the user to easily set up and save process parameters, monitor the equipment performance, and analyze results. The system also supports multiple communicates interfaces to PC-controlled systems as well as to external instrumentation and robotics controllers. M2 000 is also designed for easy and flexible installation with a compact design that can be integrated with existing facilities and systems. Its portability and small size make it ideal for operation in high production environments. Additionally, its enclosed cabinet allows for a clean and safe operation, while its cabinets are designed to minimize maintenance and reduce down time. Overall, VARIAN M 2000 is a powerful and capable sputtering unit that provides an ideal platform for applications such as thin film deposition, sputtering, etching, and other related processing. It offers a wide range of parameters to optimize processes, and ensures reliable and repeatable results. Its intuitive user interface and process control machine provide a user-friendly experience, while its compact size and portability make it easy to install and operate in any environment.