Used VARIAN M 2000 #9278013 for sale

It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.

VARIAN M 2000
Sold
Manufacturer
VARIAN
Model
M 2000
ID: 9278013
Wafer Size: 6"
Sputtering system, 6" Wafer type: Flat Target assy (2) Cassette batches: 25 Slots Cassette environment: Vacuum Main frame with (4) chambers (6) Racks Chiller Power rack (2) Monitors Pump power interface (2) Compressors (5) Oil pumps Damage parts: CE2 Chamber A2 Rack for chamber A2 Quantum source Missing parts: Turbo pump including pipe fittings Wafer temperature controller Heater power supply controller.
VARIAN M 2000 is a precision sputtering equipment ideal for the deposition of thin films. It is fitted with all the necessary components for sputtering thin films, such as a sputtering gun, fine-tuned positioning, process control, diagnostics, and a vacuum system. The sputtering gun is designed to offer rapid and precise positioning, allowing up to three targets to be sputtered simultaneously for convenience. Its energized plasma source aligns the sputtered material with the substrate, allowing uniform film deposition across the entire work area. The gun is also equipped with an easy-to-use control panel which allows for in-situ monitoring and control of the sputtering process. VARIAN M2 000 also offers precise position control which allows for thinner, more uniform deposition of the sputtered material, ensuring consistent thin film thickness across the work area. Position sensing controllers enable precision rotation and tilt of the sputtering gun. Such precise rotational and tilt control is particularly important when sputtering complex substrates at an angle. The process diagnostics feature of M 2000 allows for real-time monitoring and control of the sputtering process. Such diagnostics include particle detection, vacuum monitoring, substrate temperature measurements, gas-flow sensing, and pressure sensor readings. This allows operators to monitor and analyze the sputtering process in order to ascertain the most efficient process parameters. M2 000 is also equipped with a vacuum unit which, when combined with its other features, can provide an extremely controlled deposition process guaranteeing the most precise thin film deposition available. Detailed parameters such as leak rate, surface roughness, and film thickness can be controlled with this machine. In conclusion, VARIAN M 2000 is a sputtering tool designed for precision thin film deposition. Its precision sputtering gun, precise position control, process diagnostics, and ultra-controlled vacuum asset makes VARIAN M2 000 the ideal choice for any research requirement or commercial thin film deposition requirement.
There are no reviews yet